ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,004, issued on Dec. 9, was assigned to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Hsinchu, Taiwan).
"Method for determining parameters of three dimensional nanostructure and apparatus applying the same" was invented by Chun-Ting Liu (Taichung, Taiwan), Po-Ching He (Hsinchu, Taiwan), Wei-En Fu (Taoyuan, Taiwan) and Chun-Yu Liu (Taipei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for determining parameters of nanostructures, wherein the method includes steps as follows: Firstly, an X-ray reflection intensity measurement curve of a nanostructure to be tested is obtained by radiating the nanostructure to be tested with X-ray. The X-ray ...