US Patent Issued to IMS Nanofabrication on Nov. 25 for "Correction of blur variation in a multi-beam writer" (Austrian Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,481,214, issued on Nov. 25, was assigned to IMS Nanofabrication GmbH (Brunn am Gebirge, Austria).

"Correction of blur variation in a multi-beam writer" was invented by Christoph Spengler (Vienna), Wolf Naetar (Vienna) and Johannes Leitner (Vienna).

According to the abstract* released by the U.S. Patent & Trademark Office: "In order to compensate for undesired effects of varying elevation of a target with respect to a nominal target plane, during writing a desired pattern on the target in a charged-particle beam apparatus, the pattern is re-calculated in each of a number of segments of the target plane by: determining an elevation of the target in the segment from the nominal target p...