ALEXANDRIA, Va., March 26 -- United States Patent no. 12,261,045, issued on March 25, was assigned to IMEC VZW (Leuven, Belgium).
"Patterning method" was invented by Victor M. Blanco (Leefdaal, Belgium) and Frederic Lazzarino (Hamme-Mille, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "According to an aspect there is provided a patterning method comprising: over a lower pattern memorization layer, forming a pattern of first upper blocks, then an upper pattern memorization layer and then a pattern of second upper blocks; thereafter patterning upper trenches in the upper pattern memorization layer using lithography and etching, and forming spacer lines along sidewalls of the upper trenches to define sp...