ALEXANDRIA, Va., June 4 -- United States Patent no. 12,324,301, issued on June 3, was assigned to IMEC VZW (Leuven, Belgium).

"Contaminated interface mitigation in a semiconductor device" was invented by Tung Huei Ke (Leuven, Belgium), David Cheyns (Heffen, Belgium) and Pawel Malinowski (Heverlee, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device comprises a substrate, a first hole-transporting layer over the substrate, a first electron-transporting layer on the first hole-transporting layer, and a second hole-transporting layer over the first electron-transporting layer. At least one of the first electron-transporting layer and the second hole-transporting layer has an organic co...