ALEXANDRIA, Va., June 19 -- United States Patent no. 12,336,239, issued on June 17, was assigned to IMEC VZW (Leuven, Belgium).
"Tensile strained semiconductor monocrystalline nanostructure" was invented by Roger Loo (Leuven, Belgium), Geert Eneman (Heverlee, Belgium) and Clement Porret (Kessel-lo, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure including a semiconductor substrate having a top surface, one or more group IV semiconductor monocrystalline nanostructures, each having a first and a second extremity defining an axis parallel to the top surface of the semiconductor substrate and separated therefrom by a non-zero distance, each nanostructure having a source structure...