ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,411,327, issued on Sept. 9, was assigned to Illumina Inc. (San Diego).

"Performing structured illumination microscopy on a patterned substrate" was invented by Hongji Ren (San Diego) and John Moon (Rancho Santa Fe, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A structured illumination microscopy (SIM) system comprises: a light source; a light-structuring component to provide light from the light source with a SIM pattern for performing illuminations of a sample at a substrate having a substrate pattern, wherein a pitch of the SIM pattern is based on a characteristic of the substrate pattern; and an image sensor to detect emissions that the sam...