ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,381,098, issued on Aug. 5, was assigned to Illinois Tool Works Inc. (Glenview, Ill.).
"Wafer optical processing device and sintering furnace" was invented by Wenhua Su (Suzhou, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present application provides a wafer optical processing device and a sintering furnace, said wafer optical processing device comprising: a wafer support device (140a, 140b), an upper light source device (402), and a lower light source device (502). Said wafer support device is provided with a support piece (305), said support piece being configured to be capable of supporting said wafer above said upper surface; said upper l...