US Patent Issued to II-VI DELAWARE on Nov. 4 for "Laser processing head having contamination resistance" (German Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,459,058, issued on Nov. 4, was assigned to II-VI DELAWARE INC. (Wilmington, Del.).

"Laser processing head having contamination resistance" was invented by Romon Chakrabarti (Berlin), Danny Chan (Berlin), Patrick Kuhl (Berlin), Hannes Noack (Ludwigsfelde, Germany), Georg Schmidt (Stahnsdorf, Germany) and Alexander Muller (Ahrensfelde, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A laser processing head for directing a laser beam includes two reflectors and a sole lens element. The first reflector disposed in a housing's interior reflects the laser beam from a source to the second reflector, which then reflects the laser beam toward a process zon...