US Patent Issued to II-VI DELAWARE on Nov. 25 for "System and method to measure and calibrate laser processing machine using low-power beam profiler" (German Inventor)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,479,049, issued on Nov. 25, was assigned to II-VI DELAWARE INC. (Wilmington, Del.).

"System and method to measure and calibrate laser processing machine using low-power beam profiler" was invented by Danny Chan (Berlin).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus calibrates a laser processing machine and includes an imaging sensor and a controller. The controller directs output of a beam from the machine's low power pointer laser and directs an actuator at measurement conditions. Images of the beam are obtained by an imaging sensor, and the controller measures a parameter of at least one of the machine's optical components. The controller...