ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,491,329, issued on Dec. 9, was assigned to HSINER Co. LTD. (Taichung, Taiwan).
"Respiratory mask" was invented by Eric Chang (Taichung, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A respiratory mask include an annular frame having has a front flange surface and a rear flange surface. A single-piece flexible mask body include a second flange. Four engaging sets each of which has an engaging hole defined by an inner peripheral surface extending from the front flange surface to the rear flange surface, and an engaging rod extending from the second flange and having a retained part, a free part, and an impeding part connected between the free part ...