US Patent Issued to HOYA on May 27 for "Reflective mask blank, reflective mask, and method for manufacturing semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,313,968, issued on May 27, was assigned to HOYA Corp. (Tokyo).

"Reflective mask blank, reflective mask, and method for manufacturing semiconductor device" was invented by Masanori Nakagawa (Tokyo) and Tsutomu Shoki (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A reflective mask blank for manufacturing a reflective mask capable of suppressing peeling of an absorber pattern while suppressing an increase in the thickness of an absorber film when EUV exposure is conducted in an atmosphere including hydrogen gas. A reflective mask blank comprises a substrate, a multilayer reflection film on the substrate, and an absorber film on the multilayer reflec...