ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,492,989, issued on Dec. 9, was assigned to HORIBA STEC Co. LTD. (Kyoto, Japan).
"Gas analyzing device" was invented by Takeshi Akamatsu (Kyoto, Japan) and Masato Nakayama (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A gas analyzing device that irradiates a gas with a laser beam and detects the laser beam having penetrated the gas to analyze a component to be measured contained in the gas is configured so as to reduce a moment in a gravity direction generated about a fulcrum of an attachment location or the like is reduced to suppress optical deviation as much as possible. The gas analyzing device includes a gas cell attached to a piping t...