ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,467,856, issued on Nov. 11, was assigned to HORIBA STEC Co. LTD. (Kyoto, Japan) and HORIBA LTD. (Kyoto, Japan).
"Gas analysis device and gas analysis method" was invented by Yuhei Sakaguchi (Kyoto, Japan), Masakazu Minami (Kyoto, Japan), Kyoji Shibuya (Kyoto, Japan) and Motonobu Takahashi (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is a gas analysis device that measures a concentration or partial pressure of a halide contained in a material gas used in semiconductor manufacturing process or a by-product gas generated in semiconductor manufacturing process with good accuracy, the device being for analyzing a concent...