US Patent Issued to HONOR DEVICE on Sept. 9 for "Method for eliminating interference pattern in image, and apparatus" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,412,359, issued on Sept. 9, was assigned to HONOR DEVICE Co. LTD. (Shenzhen, China).

"Method for eliminating interference pattern in image, and apparatus" was invented by Wenzhao Liu (Shenzhen, China), Xiaogang Feng (Shenzhen, China), Kun Ma (Shenzhen, China) and Chao Chen (Shenzhen, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments include a method for eliminating an interference pattern in an image, and an apparatus, and relate to the image processing field, which can eliminate an interference pattern in an image collected by a time-of-flight (ToF) sensor arranged under a display screen of an electronic device. The method includes: obt...