ALEXANDRIA, Va., June 18 -- United States Patent no. 12,328,511, issued on June 10, was assigned to Honor Device Co. Ltd. (Shenzhen, China).
"Exposure control method and electronic device" was invented by Jirun Xu (Shenzhen, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "This application relates to the photographing field, and discloses an exposure control method and an electronic device, to resolve a problem that an electronic device cannot intelligently control exposure parameters based on different scenes. A specific solution is: separately determining a depth of field parameter, a movement level parameter, and a noise intensity factor; determining exposure parameters based on the depth of field par...