ALEXANDRIA, Va., March 12 -- United States Patent no. D1,066,648, issued on March 11, was assigned to Honeywell International Inc. (Charlotte, N.C.).
"Face mask" was invented by Xiaojin Han (Shanghai), Seven Zhou (Shanghai), Hongbing Xiang (Shanghai), Weifeng Shen (Shanghai), Xia Jin Zhao (Shanghai) and Teicheng Qu (Shanghai).
The patent was filed on June 28, 2024, under Application No. D/949,828.
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