US Patent Issued to HITACHI VANTARA on Oct. 7 for "Support device and method" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,436,971, issued on Oct. 7, was assigned to HITACHI VANTARA LTD. (Yokohama, Japan).

"Support device and method" was invented by Miho Kobayashi (Tokyo), Soichi Watanabe (Tokyo), Mitsuo Hayasaka (Tokyo) and Shimpei Nomura (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A support device and method capable of supporting construction of an optimal secondary usage environment for data are proposed.A plurality of construction candidate plans for a secondary usage environment including a copy method for copying the data between a designated copy source site and a designated copy destination site of the data are calculated. A time and a cost required for cop...