US Patent Issued to Hitachi on Oct. 7 for "Charged particle beam device, and sample observation method employing same" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,437,959, issued on Oct. 7, was assigned to Hitachi Ltd. (Tokyo).

"Charged particle beam device, and sample observation method employing same" was invented by Shunya Tanaka (Tokyo) and Takeshi Ohmori (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "There are provided a charged particle beam device capable of appropriately setting a tilt angle of a sample stage even if an observation surface is larger than the field of view, and a sample observation method using the same. The charged particle beam device is a device for obtaining an observation image of a sample by irradiating the sample with a charged particle beam, and is characterized by including:...