US Patent Issued to Hitachi on Nov. 4 for "Method for motion optimized defect inspection by a robotic arm using prior knowledge from PLM and maintenance systems" (California Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,459,129, issued on Nov. 4, was assigned to Hitachi Ltd. (Tokyo).

"Method for motion optimized defect inspection by a robotic arm using prior knowledge from PLM and maintenance systems" was invented by Supriya Sathyanarayana (Milpitas, Calif.) and Joydeep Acharya (Milpitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for object defect detection. The method may include receiving an object on a production line; computing, by a processor, a motion optimized path for a robot arm, wherein the motion optimized path comprises a path for performing a sequence of rotations by the robot arm on the object for image capturing; using the robot arm t...