US Patent Issued to Hitachi on March 11 for "Defect analysis apparatus, program, and defect analysis method" (Japanese Inventors)

ALEXANDRIA, Va., March 12 -- United States Patent no. 12,248,391, issued on March 11, was assigned to Hitachi Ltd. (Tokyo).

"Defect analysis apparatus, program, and defect analysis method" was invented by Masumi Kawakami (Tokyo) and Yasufumi Suzuki (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A defect analysis apparatus includes an execution log (program execution log) of a program (source code) in an input. The defect analysis apparatus includes an analysis start point acquisition unit configured to acquire, from the execution log and as an analysis start point, a statement of the program in which an exception occurs; an analysis end point acquisition unit configured to acquire, as an analysis end ...