US Patent Issued to HITACHI on June 24 for "Facility diagnosis device and facility diagnosis method" (Japanese Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,339,652, issued on June 24, was assigned to HITACHI LTD. (Tokyo).

"Facility diagnosis device and facility diagnosis method" was invented by Shuichi Nishino (Tokyo), Yuichi Sakurai (Tokyo) and Kazuyuki Tashiro (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The progress of deterioration of a manufacturing facility is prevented while keeping KPI within an allowable range. A facility diagnosis device includes a deterioration prevention mode definition storage unit that stores information including an operation control method for preventing deterioration of a manufacturing facility or a portion thereof for each of predetermined deterioration preventio...