US Patent Issued to HITACHI HIGH-TECH on Sept. 30 for "Sample image observation device and method for same" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,431,325, issued on Sept. 30, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Sample image observation device and method for same" was invented by Yuta Imai (Tokyo) and Junichi Katane (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a sample image observation device including an SEM and a control system configured to control the SEM. An observation region of a sample is divided into a plurality of sections, and restoration processing is performed on an image which is acquired by irradiating each section with a sparse electron beam, based on scanning characteristics in the section. A reduction in quality of a restored image due to a be...