US Patent Issued to Hitachi High-Tech on Sept. 23 for "Upper chamber for a plasma processing device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. D1,094,319, issued on Sept. 23, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Upper chamber for a plasma processing device" was invented by Koji Nagai (Tokyo), Tadayoshi Kawaguchi (Tokyo), Kazuyuki Ikenaga (Tokyo) and Kohei Sato (Tokyo).

The patent was filed on July 22, 2022, under Application No. D/847,251.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1094319&OS=D1094319&RS=D1094319

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