ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,422,386, issued on Sept. 23, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Pattern measurement device" was invented by Long Zhang (Tokyo) and Takuma Yamamoto (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "The purpose of the present disclosure is to provide a pattern measurement device that can accurately measure positional deviation between a center of gravity of a top surface of a pattern and a center of gravity of a bottom surface of the pattern, even when an incidence angle of a charged particle beam varies for each irradiation position of the charged particle beam. The pattern measurement device according to the present disclosure acquir...