US Patent Issued to Hitachi High-Tech on Sept. 23 for "Defect inspection apparatus and defect inspection method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,422,377, issued on Sept. 23, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Defect inspection apparatus and defect inspection method" was invented by Toshifumi Honda (Tokyo), Takanori Kondo (Tokyo), Nobuhiro Obara (Tokyo) and Masami Makuuchi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a defect inspection apparatus including a plurality of detection optical systems for collecting illumination scattered light from the surface of a sample, a plurality of sensors for converting the illumination scattered light collected by the corresponding detection optical systems into electrical signals and outputting detection signals, and a si...