US Patent Issued to Hitachi High-Tech on Sept. 23 for "Charged particle beam device, and method for adjusting image capturing conditions in said charged particle beam device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,406, issued on Sept. 23, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Charged particle beam device, and method for adjusting image capturing conditions in said charged particle beam device" was invented by Tomohito Nakano (Tokyo), Makoto Suzuki (Tokyo), Yuzuru Mizuhara (Tokyo) and Ryota Watanabe (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "This charged particle beam device comprises: a charged particle beam source that generates charged particle beams; an objective lens in which coil current is inputted to focus the charged particle beams on a sample; a control unit that controls the coil current; a hysteresis characteristics storage ...