ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,406,824, issued on Sept. 2, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Charged particle beam device and sample observation method" was invented by Yusuke Seki (Tokyo), Mitsuhiro Nakamura (Tokyo) and Keisuke Tanuma (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A dielectric microscopic observation is possible, which suppresses image flow regardless of scanning speed. There are provided a sample chamber 120 holding a sample 200 between a first insulating layer 121 on which a conductive layer 211 to be irradiated with a charged particle beam is laminated and a second insulating layer 122, an amplifier 141 that amplifies a potential change tha...