ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,436,114, issued on Oct. 7, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Semiconductor analysis system" was invented by Tsunenori Nomaguchi (Tokyo), Yudai Kubo (Tokyo) and Hiroyuki Chiba (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor analysis system includes a machining device that machines a semiconductor wafer to prepare a thin film sample for observation, a transmission electron microscope device that acquires a transmission electron microscope image of the thin film sample, and a host control device that controls the machining device and the transmission electron microscope device. The host control device evaluates the thin...