ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,437,958, issued on Oct. 7, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Electron beam application device" was invented by Takashi Ohshima (Tokyo), Hideo Morishita (Tokyo), Tatsuro Ide (Tokyo), Hiroyasu Shichi (Tokyo), Yoichi Ose (Tokyo) and Junichi Katane (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "An activation mechanism is provided in an activation region of an electron gun, and includes a light source device 3 configured to irradiate a photocathode with excitation light, a heat generating element, an oxygen generation unit configured to generate oxygen by heating the heat generating element, and an emission current meter configured to m...