US Patent Issued to Hitachi High-Tech on Oct. 28 for "Charged particle beam apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,456,598, issued on Oct. 28, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Charged particle beam apparatus" was invented by Takayasu Iwatsuka (Tokyo), Hideto Dohi (Tokyo), Tomoyo Sasaki (Tokyo) and Wen Li (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The charged particle beam apparatus includes a charged particle source generating a charged particle beam, a deflector deflecting the charged particle beam, a detector detecting secondary electrons emitted from an irradiation target in response to irradiation with the charged particle beam, and a processor system. The processor system (A) acquires a first time-series change in secondary electron ...