ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,449,825, issued on Oct. 21, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Gas supply control device" was invented by Yoshifumi Ogawa (Tokyo) and Yutaka Kouzuma (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A gas supply control device that supplies a gas to a processing chamber in which a workpiece is processed, includes: a first port connected to a gas source of a purge gas; a second port to which a gas source of a processing gas is connected; a collective pipe in which each of the purge gas and the processing gas supplied from the first port and the second port merges, respectively, and flow; a first flow rate controller provided between th...