US Patent Issued to Hitachi High-Tech on Oct. 21 for "Experiment point recommendation device, experiment point recommendation method, and semiconductor device manufacturing device" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,450,520, issued on Oct. 21, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Experiment point recommendation device, experiment point recommendation method, and semiconductor device manufacturing device" was invented by Yuyao Wang (Tokyo), Yasuhide Mori (Tokyo), Masashi Egi (Tokyo), Takeshi Ohmori (Tokyo), Satoshi Sakai (Tokyo) and Kohei Matsuda (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "For a machine learning model that receives control parameters of a semiconductor processing device and outputs shape parameters that express a processed shape of a semiconductor sample processed by the semiconductor processing device, an experiment point obt...