ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,629, issued on Oct. 14, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Substrate inspection device" was invented by Yoshihiro Satou (Tokyo), Toshio Masuda (Tokyo), Akio Yazaki (Tokyo) and Kenshiro Ohtsubo (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "The purpose of the present invention is to provide a substrate inspection device that increases the flatness of a substrate during inspection, and improves the detection sensitivity of foreign matter. Therefore, the present invention is a substrate inspection device provided with a turntable on which a substrate to be inspected is mounted, and a clamp mechanism that holds the substrate on the...