ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,442,455, issued on Oct. 14, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Gas supply apparatus, vacuum processing apparatus, and gas supply method" was invented by Yoshifumi Ogawa (Tokyo), Yutaka Kouzuma (Tokyo), Keisuke Akinaga (Tokyo), Kazuyuki Hirozane (Tokyo) and Yasushi Sonoda (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a gas supply apparatus that can effectively suppress a trouble caused by backflow of a process gas to the upstream side when processing is performed by using the process gas inside a chamber. The gas supply apparatus supplies gas to a processing chamber in which a sample is processed. The gas supply a...