US Patent Issued to Hitachi High-Tech on Oct. 14 for "Diagnosis device, diagnosis method, plasma processing apparatus, and semiconductor device manufacturing system" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,591, issued on Oct. 14, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Diagnosis device, diagnosis method, plasma processing apparatus, and semiconductor device manufacturing system" was invented by Shota Umeda (Tokyo), Kenji Tamaki (Tokyo), Masahiro Sumiya (Tokyo) and Yoshito Kamaji (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A diagnosis device that uses information from state sensors provided in a plasma processing apparatus for plasma processing a specimen to diagnose deterioration states of components configuring the plasma processing apparatus includes an execution unit that computes and calculates deterioration degree of each of t...