US Patent Issued to Hitachi High-Tech on Nov. 18 for "Pattern inspection/measurement device, and pattern inspection/measurement program" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,166, issued on Nov. 18, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Pattern inspection/measurement device, and pattern inspection/measurement program" was invented by Ryugo Kagetani (Tokyo), Kaoru Fukaya (Tokyo) and Hiroyuki Shindo (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An object of the disclosure is to provide a pattern inspection and measurement apparatus that can accurately specify a corner point formed on a sample. The pattern inspection and measurement apparatus according to the disclosure specifies a pair of corner points as a corner pair candidate on design data, and specifies a corner point on an actually formed shape pa...