ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,295, issued on Nov. 18, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).
"Analysis device and analysis method" was invented by Yufuku Matsushita (Tokyo), Atsushi Kishioka (Tokyo), Haruyoshi Yamamoto (Tokyo) and Masafumi Miyake (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "An analysis device measures ion concentration in a sample to detect an abnormality using an ion selective electrode. The analysis device includes an ion selective electrode that obtains a potential based on the ion concentration, a reference electrode that obtains a potential based on a reference liquid, a measurement unit that measures an electromotive force between the io...