US Patent Issued to HITACHI HIGH-TECH on Nov. 11 for "Stage apparatus and charged particle beam apparatus including stage apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,671, issued on Nov. 11, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Stage apparatus and charged particle beam apparatus including stage apparatus" was invented by Akira Nishioka (Tokyo), Motohiro Takahashi (Tokyo), Masaki Mizuochi (Tokyo), Yasuhiro Ando (Tokyo) and Raifu Yamamoto (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A stage apparatus includes a lower stage that moves in a Y-axis direction, an upper stage that floats from the lower stage and moves at least in an X-axis direction orthogonal to the Y-axis direction, a heat exchanger that cools a Y table of the lower stage with a refrigerant, and a control device that controls an ...