ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,664, issued on Nov. 11, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Charged particle gun and charged particle beam system" was invented by Masahiro Fukuta (Tokyo), Keigo Kasuya (Tokyo) and Noriaki Arai (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An electron gun 901 capable of suppressing an uneven temperature distribution at an extraction electrode and a length-measuring SEM 900 are provided. The electron gun 901 is equipped with: a charged particle source 1; an extraction electrode 3 for extracting charged particles from the charged particle source 1 and allowing some of the charged particles to pass while blocking some other charge...