US Patent Issued to Hitachi High-Tech on May 27 for "Defect inspection device and defect inspection method" (Japanese Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,313,566, issued on May 27, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Defect inspection device and defect inspection method" was invented by Toshifumi Honda (Tokyo), Yuta Urano (Tokyo), Shunichi Matsumoto (Tokyo) and Hisaaki Kanai (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A defect inspection device includes an illumination unit that irradiates a sample with a linear illumination spot; a condensing detection unit that condenses reflected light of the illumination spot from the sample; and a sensor unit that forms an optical image on a light reception surface, and outputs the optical image as an electrical signal. An angle Alpha formed ...