US Patent Issued to HITACHI HIGH-TECH on May 13 for "Automatic analysis apparatus and cleaning method for same" (Japanese Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,298,324, issued on May 13, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Automatic analysis apparatus and cleaning method for same" was invented by Misato Koike (Tokyo), Masashi Akutsu (Tokyo), Masashi Fukaya (Tokyo) and Megumi Kato (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An automatic analysis apparatus includes: an automatic analysis unit 100 which includes a dispensing mechanism including a probe which is configured to dispense a sample or a reagent into a reaction container, a cleaning mechanism; and a control unit 124. The control unit includes a storage unit 124a configured to store count values which indicate weightings to contam...