US Patent Issued to HITACHI HIGH-TECH on March 4 for "Method, apparatus, and program for determining condition related to captured image of charged particle beam apparatus" (Japanese Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,243,711, issued on March 4, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Method, apparatus, and program for determining condition related to captured image of charged particle beam apparatus" was invented by Takahiro Nishihata (Tokyo), Yuji Takagi (Tokyo), Takuma Yamamoto (Tokyo), Yasunori Goto (Tokyo) and Yasutaka Toyoda (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method, an apparatus, and a program for more appropriately determining a condition for appropriately recognizing a semiconductor pattern are provided. A method for determining a condition related to a captured image of a charged particle beam apparatus including: acquiring, b...