US Patent Issued to Hitachi High-Tech on March 25 for "Sample observation device and method" (Japanese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,260,545, issued on March 25, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Sample observation device and method" was invented by Yuki Doi (Tokyo), Naoaki Kondo (Tokyo), Minoru Harada (Tokyo), Hideki Nakayama (Tokyo), Yohei Minekawa (Tokyo) and Yuji Takagi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "In learning processing performed before sample observation processing (steps S705 to S708), the sample observation device acquires a low-picture quality learning image under a first imaging condition for each defect position indicated by defect position information, determines an imaging count of a plurality of high-picture quality learning ima...