US Patent Issued to HITACHI HIGH-TECH on June 24 for "Charged particle beam device, and method for controlling charged particle beam device" (Japanese Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,340,970, issued on June 24, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Charged particle beam device, and method for controlling charged particle beam device" was invented by Shingo Hayashi (Tokyo), Hideyuki Kazumi (Tokyo), Zhaohui Cheng (Tokyo) and Hideto Dohi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention has been made in view of the above problems, and an object thereof is to provide a charged particle beam device capable of improving the reproducibility of the magnetic field response of a magnetic field lens and realizing highly-accurate electron orbit control in a short time. A charged particle beam device accordi...