US Patent Issued to HITACHI HIGH-TECH on June 17 for "Electron gun and electron beam application device" (Japanese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,334,297, issued on June 17, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Electron gun and electron beam application device" was invented by Hideo Morishita (Tokyo), Takashi Ohshima (Tokyo), Yoichi Ose (Tokyo), Toshihide Agemura (Tokyo) and Makoto Kuwahara (Nagoya, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The apparatus includes: a photocathode including a substrate and a photoelectric film formed on the substrate; a light source configured to emit a pulsed excitation light; a condenser lens facing the substrate of the photocathode and configured to condense the pulsed excitation light toward the photocathode; a first anode electrode and ...