ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,708, issued on June 10, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Charged particle beam device and aberration correction method" was invented by Shingo Hayashi (Tokyo), Hideto Dohi (Tokyo), Zhaohui Cheng (Tokyo) and Hideyuki Kazumi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A charged particle optical system includes an aberration corrector 209 that corrects aberration of a charged particle beam and has multipoles of a plurality of stages. The aberration corrector generates a plurality of multipole fields in a superimposed manner for each of the multipoles of the plurality of stages in order to correct the aberration of the charged...