US Patent Issued to HITACHI HIGH-TECH on July 8 for "Charged particle beam apparatus" (Japanese Inventors)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,826, issued on July 8, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Charged particle beam apparatus" was invented by Tomonori Nakano (Tokyo), Yu Yamazawa (Tokyo) and Hideo Kashima (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A charged particle beam apparatus including a winding aberration corrector capable of correcting a chromatic aberration is provided. A multi-pole lens includes a magnetic core 150, a plurality of current lines 101 to 112, a plurality of wire-shaped electrodes 301 to 312, insulating electrode fixing portions 313 to 342 for fixing the plurality of electrodes to a structure in a vacuum container, and conductive shields...