US Patent Issued to Hitachi High-Tech on July 22 for "Charged particle beam apparatus and focus adjusting method therefor" (Japanese Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,368,017, issued on July 22, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Charged particle beam apparatus and focus adjusting method therefor" was invented by Keisuke Igarashi (Tokyo), Wei Chean Tan (Tokyo), Mai Yoshihara (Tokyo) and Hiroyuki Chiba (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A technique that enables automatic focus adjustment even for a sample having regions with different heights is proposed. A charged particle beam device according to the disclosure includes: a sample holder configured to hold a sample; a sample stage configured to move the sample; a charged particle gun and a charged particle beam column configured to i...