ALEXANDRIA, Va., July 16 -- United States Patent no. 12,361,541, issued on July 15, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).
"Measurement apparatus and measurement method" was invented by Hiromitsu Nakagawa (Tokyo), Takeshi Tanaka (Tokyo) and Daisuke Fukui (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a measurement apparatus including a processor and a storage unit. The storage unit holds measurement data of each time point which is obtained by a photographing apparatus, and temporal-spatial constraints. The processor extracts a position of an object from the measurement data of each time point, determines whether the object satisfies the temporal-spatial constraints, and determin...