US Patent Issued to HITACHI HIGH-TECH on July 15 for "Diffraction grating, method for manufacturing diffraction grating, and photomask" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,360,298, issued on July 15, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Diffraction grating, method for manufacturing diffraction grating, and photomask" was invented by Kenta Yaegashi (Tokyo) and Yoshisada Ebata (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An objective of the present invention is to improve a diffraction grating. A molding member including a substrate and a resist pattern having a surface shape including grooves is prepared. The grooves include bottom portions BP1 and top portions TP1 that are alternately repeated in an X direction, and that each extend in a Y direction. The bottom portions adjacent to each other have an...